| Thin
Film Fabrication
Physical Vapor Deposition (PVD),
Ion Assisted PVD, Plasma Assisted
PVD,
Dual Source PVD
Our facility houses multiple large reaction chambers
dedicated to research and production. Each chamber is capable of uniformly applying,
co-synthesizing and compounding of n-film materials and multilayer systems.
Chemical Vapor Deposition (CVD), and
DC Sputtering
Thick Film Spin Coatings and Thin
Film Pigment
|
Substrate
and Film Characterization
Optical Measurement
(Spectrometry)
DRLI can provide rapid, high
resolution measurements for many shapes and sizes;
from small flat samples to large cylindrical,
spherical or aspherical substrates.
Standard measurements include
reflectance, transmittance, p or s plane polarized
transmittance vs. angle, non-normal reflectance, and
hemispherical reflectance from diffuse substrates.
Range: Ultraviolet
(UV), Visible, and Infrared (IR); 0.19µm
(190nm) to 50µm
XPS, Scanning Auger, NMR & ToF SIMS
Available.
We can also provide thin
film physical thickness with our on-site interferometer,
sheet resistance of conductive films and other physical
properties.
|
Materials
Analysis
|
Inverse
Synthesis of Optical Constants
Film Growth and Morphology
3D
- Diffractive Layer Patterns
Elipsometry
|
Chromaticity
Coordinates Design
Optimization R/T
Phase Change Calculation Tolerance
Analysis |
|
Environmental
Testing
Thermal and Humidity Testing
On-site 24" Thermal
& Humidity Environmental Testing Chamber can
provide long heat/humidity cycles per customer
specification, E.g. MIL-STD-810C
Large Area UV And Ozone
Testing
Adhesion and Abrasion
Testing
|
Substrate
Fabrication, Polishing and Cleaning
Capable of grinding and polishing
substrates up to 12" in diameter. We have
experience with many substrate materials including fused
silica, germanium, and silicon.
|
|
